JTC-1TRO/EDI: Industry-Integrated Ultrasonic Cleaning Support System – 1-Ton Double-Stage RO + EDI Ultrapure Water Unit
Executive Summary
Tailored exclusively for the ultrasonic cleaning industry, the JTC-1TRO/EDI serves as a critical supporting component for ultrasonic cleaning equipment, integrating a high-efficiency 1-ton double-stage Reverse Osmosis (RO) purification system with advanced Electrodeionization (EDI) technology. Recognizing that ultrasonic cavitation efficiency and post-cleaning residue control are directly dependent on water purity, this system delivers consistent ultrapure water to optimize ultrasonic cleaning performance—all within a space-efficient footprint of 2.5M×1.5M×2M, ideal for workshop integration with existing or new ultrasonic cleaning lines.
1. Core Technology: 1-Ton Double-Stage RO + EDI Ultrapure Water Generation
Engineered to meet the stringent water quality demands of ultrasonic cleaning (where ionic contaminants, particulates, and organics can compromise component cleanliness), the JTC-1TRO/EDI adopts a three-stage purification workflow:
1.1 Pre-Treatment Train
A robust pre-treatment module (multi-media filtration + activated carbon adsorption + precision sediment filtration) removes suspended solids (>5μm), free chlorine (<0.1ppm), and organic compounds (TOC ≤ 3ppm). This prevents RO membrane fouling and EDI module scaling, ensuring long-term operational stability—critical for continuous ultrasonic cleaning operations.
1.2 Double-Stage RO Purification
Primary RO Stage: Achieves a 96%+ salt rejection rate, reducing total dissolved solids (TDS) from raw water to ≤ 100μS/cm.
Secondary RO Stage: Further polishes permeate to conductivity ≤ 3μS/cm, eliminating residual ions that could interfere with ultrasonic cavitation or leave deposits on cleaned parts.
1.3 EDI Final Polishing
The integrated EDI module utilizes continuous electrodeionization (no chemical regeneration required) to produce ultrapure water with:
Resistivity: Up to 18.2 MΩ·cm (at 25℃)
Particle Count: ≤ 5 particles/ml (≥0.1μm)
This meets the Class 1 water standards for precision ultrasonic cleaning (e.g., for semiconductor wafers, medical implants, and optical lenses).
2. Ultrasonic Cleaning Equipment Compatibility
The JTC-1TRO/EDI is designed for seamless integration with all common ultrasonic cleaning setups, delivering synchronized ultrapure water supply for:
Single/Multi-Tank Ultrasonic Cleaners: Provides low-TOC rinse water to prevent recontamination of parts post-ultrasonic cleaning, enhancing flux residue and metal fines removal.
Semi-Automatic/Fully Automatic Ultrasonic Lines: Integrates with PLC control systems to match water flow with cleaning cycles (e.g., pre-rinse, ultrasonic wash, final rinse), reducing manual intervention and improving line throughput.
Custom Ultrasonic Systems: Adapts to both low-frequency (28-40kHz) heavy-duty degreasing and high-frequency (80-120kHz) precision cleaning applications—its low-conductivity water minimizes electrochemical corrosion on sensitive components (e.g., PCB assemblies, titanium surgical tools).
The JTC-1TRO/EDI is more than a water purification unit—it is a purpose-built supporting system that elevates the consistency and quality of your ultrasonic cleaning processes. By combining industry-leading RO+EDI technology with ultrasonic equipment compatibility, it delivers a turnkey solution for high-performance cleaning operations.
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JTC-1TRO/EDI: 1-Ton Double-Stage RO+EDI Unit for Ultrasonic Cleaning (2.5M×1.5M×2M) Images
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